Advances in Imaging and Electron Physics, Volume 204, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
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Zielgruppe
Physicists, electrical engineers and applied mathematicians in all branches of image processing and microscopy as well as electron physics in general.
Weitere Infos & Material
1. New physical principle for interference of light and material particles Roman Castaneda and Giorgio Matteucci 2. A Review of Scanning Electron Microscopy in Near Field Emission Mode Taryl L. Kirk 3. Nonscalar Mathematical Morphology Jasper van de Gronde and Jos B.T.M. Roerdink 4. Energy Analysing and Energy Selecting Electron Microscopes A.J.F. Metherel
Hawkes, Peter W.
Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 - 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.
