Buch, Englisch, 324 Seiten, Format (B × H): 152 mm x 229 mm, Gewicht: 660 g
Buch, Englisch, 324 Seiten, Format (B × H): 152 mm x 229 mm, Gewicht: 660 g
ISBN: 978-0-12-812091-0
Verlag: William Andrew Publishing
Advances in Imaging and Electron Physics, Volume 199, the latest release in a series that merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy features extended articles on the physics of electron devices (especially semiconductor devices). Specific topics include discussions on Micro-XRF in scanning electron microscopes, and an interesting take on the variational approach for simulation of equilibrium ion distributions in ion traps regarding Coulomb interaction, amongst others. Users will find a comprehensive resource on the most important aspects of particle optics at high and low energies, microlithography, image science and digital image processing.
In addition, topics of interest, including electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains are presented and discussed.
Zielgruppe
Physicists, electrical engineers and applied mathematicians in all branches of image processing and microscopy as well as electron physics in general.
Weitere Infos & Material
1. Micro-XRF in Scanning Electron MicroscopesM. Haschke and S. Boehm2. A Variational Approach for Simulation of Equilibrium Ion Distributions in Ion Traps with Regard to Coulomb InteractionI.A. Kopaev, D. Grinfeld, M.A. Monastyrskiy, R.S. Ablizen, S.S. Alimpiev and A.A. Trubitsyn3. Analytical Review of Direct STEM Imaging Techniques for Thin SamplesI. Lazic and E.G.T. Bosch4. Quantum Nano-Optics in the Electron MicroscopeL.H.G. Tizei and M. Kociak5. Component Identification and Interpretation: A Perspective on Tower of KnowledgeM. Xu, J. Ren and Z. Wang