Advances in Imaging and Electron Physics

Erscheinungsjahr 2020
ISBN: 978-0-12-820997-4
Verlag: William Andrew Publishing

Buch, Englisch, 344 Seiten, Format (B × H): 152 mm x 229 mm, Gewicht: 680 g

Advances in Imaging and Electron Physics, Volume 213, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.

Zielgruppe

Physicists, electrical engineers and applied mathematicians in all branches of image processing and microscopy as well as electron physics in general

Autoren/Hrsg.

Weitere Mitwirkende

Hawkes, Peter W.

Fachgebiete

• Technische Wissenschaften Sonstige Technologien | Angewandte Technik Signalverarbeitung, Bildverarbeitung, Scanning
• Mathematik | Informatik EDV | Informatik Informatik Bildsignalverarbeitung
• Naturwissenschaften Physik Elektromagnetismus Mikroskopie, Spektroskopie
• Naturwissenschaften Physik Elektromagnetismus Optik

Inhaltsverzeichnis

Part 1: Quantum degeneracy 1. Partially coherent quantum degenerate electron matter waves Sam Keramati, Eric Jones, Jeremy Armstrong, Herman Batelaan

Part 2: The contribution of atom probe tomography to the correlation of the optical and structural properties of semiconductor nanostructures 2. Laser-assisted atom probe tomography Lorenzo Rigutti 3. Inaccuracies in atom probe measurements of semiconductor composition Lorenzo Rigutti 4. Atom probe-based correlative microscopy Lorenzo Rigutti 5. In-situ optical spectroscopy within an atom probe Lorenzo Rigutti

Part 3: CPO Proceedings Papers 6. Derivation, Cross-Validation, and Comparison of Analytic Formulas for Electrostatic Deflector Aberrations Eremey Valetov, Martin Berz 7. Analysis and Fringe Field Scaling of a Legacy Set of Electrostatic Deflector Aberration Formulas Eremey Valetov

Part 4: Advances in Optical Electron Microscopy 8. Scanning Optical Microscopy C. J. R. Sheppard

Über Autor(innen)

Hawkes, Peter W.
Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 - 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.