Buch, Englisch, 458 Seiten, Format (B × H): 152 mm x 229 mm, Gewicht: 820 g
Buch, Englisch, 458 Seiten, Format (B × H): 152 mm x 229 mm, Gewicht: 820 g
ISBN: 978-0-12-801935-1
Verlag: William Andrew Publishing
The volume includes chapters focusing specifically on electron and proton irradiation of silicon, point defects in zinc oxide and gallium nitride, ion implantation defects and shallow junctions in silicon and germanium, and much more. It will help support students and scientists in their experimental and theoretical paths.
Zielgruppe
<p>students, researchers from both academics and industrial companies dealing with semiconductor or semiconductor applications</p>
Fachgebiete
Weitere Infos & Material
- Role of Defects in the Dopant Diffusion in Si
Peter Pichler
- Electron and Proton Irradiation of Silicon
Arne Nylandsted Larsen and Abdelmadjid Mesli
- Ion Implantation Defects and Shallow Junctions in SI and GE
Enrico Napolitani and Giuliana Impellizzeri
- Defective Solid-phase Epitaxial Growth of Si
Nicholas G. Rudawski, Aaron G. Lind and Thomas P. Martin
- Nanoindentation of Silicon and Germanium
Mangalampalli S. R. N. Kiran, Bianca Haberl, Jodie E. Bradby and James S. Williams
- Analytical Techniques for Electrically Active Defect Detection
Eddy Simoen, Johan Lauwaert and Henk Vrielinck
- Surface and Defect States in Semiconductors Investigated by Surface Photovoltage
Daniela Cavalcoli, Beatrice Fraboni and Anna Cavallini
- Point Defects in ZnO
Matthew D. McCluskey
- Point Defects in GaN
Michael A. Reshchikov
- Point Defects in Silicon CarbideNaoya Iwamoto and Bengt G. Svensson