Hawkes / Kasper | Principles of Electron Optics | Buch | 978-0-12-813369-9 | sack.de

Buch, Englisch, 766 Seiten, Format (B × H): 191 mm x 235 mm, Gewicht: 20 g

Hawkes / Kasper

Principles of Electron Optics

Applied Geometrical Optics
2. Auflage 2017
ISBN: 978-0-12-813369-9
Verlag: William Andrew Publishing

Applied Geometrical Optics

Buch, Englisch, 766 Seiten, Format (B × H): 191 mm x 235 mm, Gewicht: 20 g

ISBN: 978-0-12-813369-9
Verlag: William Andrew Publishing


Principles of Electron Optics: Applied Geometrical Optics, Second Edition gives detailed information about the many optical elements that use the theory presented in Volume 1: electrostatic and magnetic lenses, quadrupoles, cathode-lens-based instruments including the new ultrafast microscopes, low-energy-electron microscopes and photoemission electron microscopes and the mirrors found in their systems, Wien filters and deflectors. The chapter on aberration correction is largely new. The long section on electron guns describes recent theories and covers multi-column systems and carbon nanotube emitters. Monochromators are included in the section on curved-axis systems.

The lists of references include many articles that will enable the reader to go deeper into the subjects discussed in the text.

The book is intended for postgraduate students and teachers in physics and electron optics, as well as researchers and scientists in academia and industry working in the field of electron optics, electron and ion microscopy and nanolithography.
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Zielgruppe


<p>Postgraduate students and teachers in physics and electron optics; researchers and scientists in academia and industry working in the field of electron optics, electron and ion microscopy, and nanolithography</p>

Weitere Infos & Material


PART VII - INSTRUMENTAL OPTICS 35. Electrostatic Lenses  36. Magnetic Lenses  37. Electron Mirrors, Low-energy-electron Microscopes and Photoemission Electron Microscopes, Cathode Lenses and Field-emisssion Microscopy  38. The Wien Filter  39. Quadrupole Lenses  40. Deflection Systems 

PART VIII - ABERRATION CORRECTION AND BEAM INTENSITY DISTRIBUTION (CAUSTICS) 41. Aberration Correction  42. Caustics and their Applications 

PART IX - ELECTRON GUNS 43. General Features of Electron Guns  44. Theory of Electron Emission  45. Pointed Cathodes without Space Charge  46. Space Charge Effects  47. Brightness  48. Emittance  49. Gun optics  50. Complete Electron Guns 

PART X - SYSTEMS WITH A CURVED OPTIC AXIS 51. General Curvilinear Systems  52. Magnetic Sector Fields  53. Unified Theories of Ion Optical Systems


Hawkes, Peter W.
Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 - 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.

Kasper, Erwin
Erwin Kasper studied physics at the Universities of Münster and Tübingen (Germany), where he obtained his PhD in 1965 and the habilitation to teach physics in 1969. After scientific spells in the University of Tucson, Arizona (1966) and in Munich (1970), he resumed his research and teaching in the Institute of Applied Physics, University of Tübingen, where he was later appointed professor. He lectured on general physics and especially on electron optics. The subject of his research was theoretical electron optics and related numerical methods on which he published numerous papers. After his retirement in 1997, he published a book on numerical field calculation (2001).


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