Buch, Englisch, Band 269, 223 Seiten, Previously published in hardcover, Format (B × H): 155 mm x 235 mm, Gewicht: 365 g
Computational Approach
Buch, Englisch, Band 269, 223 Seiten, Previously published in hardcover, Format (B × H): 155 mm x 235 mm, Gewicht: 365 g
Reihe: Springer Series in Materials Science
ISBN: 978-3-030-09542-0
Verlag: Springer International Publishing
This book presents extensive information on the mechanisms of epitaxial growth in III-nitride compounds, drawing on a state-of-the-art computational approach that combines ab initio calculations, empirical interatomic potentials, and Monte Carlo simulations to do so. It discusses important theoretical aspects of surface structures and elemental growth processes during the epitaxial growth of III-nitride compounds. In addition, it discusses advanced fundamental structural and electronic properties, surface structures, fundamental growth processes and novel behavior of thin films in III-nitride semiconductors. As such, it will appeal to all researchers, engineers and graduate students seeking detailed information on crystal growth and its application to III-nitride compounds.
Zielgruppe
Research
Autoren/Hrsg.
Fachgebiete
- Naturwissenschaften Physik Elektromagnetismus Halbleiter- und Supraleiterphysik
- Naturwissenschaften Physik Physik Allgemein Theoretische Physik, Mathematische Physik, Computerphysik
- Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Materialwissenschaft: Elektronik, Optik
- Naturwissenschaften Physik Thermodynamik Festkörperphysik, Kondensierte Materie
- Technische Wissenschaften Verfahrenstechnik | Chemieingenieurwesen | Biotechnologie Technologie der Oberflächenbeschichtung
Weitere Infos & Material
Introduction.- Computational Methods.- Fundamental Properties of III-Nitrides.- Growth Processes.- Novel Behaviour of Thin Films.- Summary.