Developments in Surface Contamination and Cleaning: Methods for Surface Cleaning

Volume 9
Erscheinungsjahr 2016
ISBN: 978-0-323-43157-6
Verlag: Elsevier Science

Buch, Englisch, 212 Seiten, Format (B × H): 155 mm x 231 mm, Gewicht: 499 g

Developments in Surface Contamination and Cleaning: Methods for Surface Cleaning, Volume 9, part of the Developments in Surface Contamination and Cleaning series provide a state-of-the-art guide to the current knowledge on the behavior of film-type and particulate surface contaminants and their associated cleaning methods.

This newest volume in the series discusses methods of surface cleaning of contaminants and the resources that are needed to deal with them. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning. A strong theme running through the series is that of surface contamination and cleaning at the micro and nano scales.

Zielgruppe

<p>Engineers, scientists and technicians involved in research and development, manufacturing, process and quality control, and procurement specifications across sectors including microelectronics, semiconductors, aerospace, optics, xerography and medical applications.</p>

Autoren/Hrsg.

Kohli, Rajiv

Mittal, Kashmiri L.

Fachgebiete

• Technische Wissenschaften Elektronik | Nachrichtentechnik Elektronik Halb- und Supraleitertechnologie
• Technische Wissenschaften Verfahrenstechnik | Chemieingenieurwesen | Biotechnologie Technologie der Chemischen Reinigungsmittel
• Technische Wissenschaften Maschinenbau | Werkstoffkunde Produktionstechnik Fertigungstechnik

Inhaltsverzeichnis

Chapter 1. Nonaqueous Cleaning Challenges for Preventing Damage to Fragile Nanostructures

Chapter 2. Gas-Phase Cleaning for Removal of Surface Contaminants

Chapter 3. Laser-Induced Spray Jet Cleaning

Chapter 4. Brush Scrubbing for Post-CMP Cleaning

Chapter 5. Contamination Removal From UV and EUV Photomasks

Chapter 6. Aqueous Displacement of Water-Immiscible Cleaning Solvents: Cleaning Enhancement Using Ultrasonics

Über Autor(innen)

Mittal, Kashmiri L.
Dr. Kashmiri (Kash) Mittal was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of adhesion science and technology and in surface contamination and cleaning. He is the founding editor of the Journal of Adhesion Science and Technology and is editor of more than 130 published books, many of them dealing with surface contamination and cleaning. In 2002, the Kash Mittal Award was inaugurated for his extensive efforts and significant contributions to the field of colloid and interface chemistry. Among his numerous awards, Dr. Mittal was awarded the title honoris causa by the Maria Curie-Sklodowska University in Lubin, Poland in 2003. Currently, he is teaching and consulting in the areas of surface contamination and cleaning and in adhesion science and technology.