Developments in Surface Contamination and Cleaning, Volume 8

Cleaning Techniques
Erscheinungsjahr 2014
ISBN: 978-0-323-29961-9
Verlag: Elsevier Science

Buch, Englisch, 234 Seiten, Format (B × H): 155 mm x 229 mm, Gewicht: 499 g

As device sizes in the semiconductor industries shrink, devices become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a whole provides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area. Several novel wet and dry surface cleaning methods are addressed in this Volume. Many of these methods have not been reviewed previously, or the previous reviews are dated. These methods are finding increasing commercial application and the information in this book will be of high value to the reader. Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control these books will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography.

Zielgruppe

Researchers and Engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography;  Researchers in an academic

Autoren/Hrsg.

Kohli, Rajiv

Mittal, Kashmiri L.

Fachgebiete

• Naturwissenschaften Chemie Physikalische Chemie Kolloidchemie
• Technische Wissenschaften Verfahrenstechnik | Chemieingenieurwesen | Biotechnologie Technologie der Oberflächenbeschichtung
• Naturwissenschaften Physik Thermodynamik Oberflächen- und Grenzflächenphysik, Dünne Schichten

Inhaltsverzeichnis

1 Cleaning for Removal of Post Chemical Mechanical Planarization Residue (Manish Keswani)
2 Liquid Displacement Drying Techniques (Ian Parry)
3 UV Ozone Cleaning (Rajiv Kohli)
4 Carbon Dioxide Dry Ice Spray Cleaning (Simon Motschmann)
5 Use of Water Ice Pellets for Removal of Surface Contaminants (Rajiv Kohli)
6 Advanced Cleaning Processes in Semiconductor Manufacturing (Mahmood Toofan)
7 Precision Cleaning of Electronic Assemblies (Helmut Schweigert)

Über Autor(innen)

Mittal, Kashmiri L.
Dr. Kashmiri (Kash) Mittal was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of adhesion science and technology and in surface contamination and cleaning. He is the founding editor of the Journal of Adhesion Science and Technology and is editor of more than 130 published books, many of them dealing with surface contamination and cleaning. In 2002, the Kash Mittal Award was inaugurated for his extensive efforts and significant contributions to the field of colloid and interface chemistry. Among his numerous awards, Dr. Mittal was awarded the title honoris causa by the Maria Curie-Sklodowska University in Lubin, Poland in 2003. Currently, he is teaching and consulting in the areas of surface contamination and cleaning and in adhesion science and technology.