Buch, Englisch, 670 Seiten, Format (B × H): 220 mm x 284 mm, Gewicht: 2018 g
Buch, Englisch, 670 Seiten, Format (B × H): 220 mm x 284 mm, Gewicht: 2018 g
ISBN: 978-1-4200-5519-1
Verlag: CRC Press
Designed for science and engineering students, this text focuses on emerging trends in processes for fabricating MEMS and NEMS devices. The book reviews different forms of lithography, subtractive material removal processes, and additive technologies. Both top-down and bottom-up fabrication processes are exhaustively covered and the merits of the different approaches are compared. Students can use this color volume as a guide to help establish the appropriate fabrication technique for any type of micro- or nano-machine.
Zielgruppe
Undergraduate
Autoren/Hrsg.
Fachgebiete
Weitere Infos & Material
Lithography: Photolithography. Next-Generation Lithographies and Lithography Research. Pattern Transfer With Subtractive Techniques: Dry Etching. Wet Chemical Etching and Wet Bulk Micromachining—Pools as Tools. Thermal Energy-Based Removing. Mechanical Energy-Based Removing. Pattern Transfer With Additive Techniques: Physical and Chemical Vapor Deposition—Thin Film Properties and Surface Micromachining. Chemical, Photochemical and Electrochemical Forming Techniques. Thermal Energy-Based Forming Techniques—Thermoforming. Micro-Molding Techniques—LIGA.