Semiconductor Wafer Fabrication, Coatings and Tribology

Erscheinungsjahr 2023
ISBN: 978-3-0364-0324-3
Verlag: Trans Tech Publications

Buch, Englisch, 156 Seiten, Format (B × H): 170 mm x 240 mm, Gewicht: 410 g

The special edition includes articles that represented the latest research results and engineering solutions in the synthesis of nanomaterials, analysis processes of semiconductor wafer fabrication, and some decisions on coatings and exploration of tribological performance of several polymer and composite materials. This special edition will be interesting to specialists in nanomaterials synthesis, semiconductor power device production and protective coatings in machinery.

Autoren/Hrsg.

Marek, Juraj

Pobegen, Gregor

Grossner, Ulrike

Shoukry, Hamada

Fang, Zhigang

Fachgebiete

• Technische Wissenschaften Elektronik | Nachrichtentechnik Elektronik Halb- und Supraleitertechnologie
• Technische Wissenschaften Maschinenbau | Werkstoffkunde Maschinenbau Tribologie
• Technische Wissenschaften Maschinenbau | Werkstoffkunde Produktionstechnik Fertigungstechnik
• Technische Wissenschaften Verfahrenstechnik | Chemieingenieurwesen | Biotechnologie Technologie der Oberflächenbeschichtung
• Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Materialwissenschaft: Elektronik, Optik

Inhaltsverzeichnis

Preface
Chapter 1: Synthesis and Applications of Nanomaterials
Synthesis and Characterization of Silver Nanoparticles Prepared from Pomegranate Peel Extracts and its Antibacterial Activity
Preparation and Characterization of Iron Nanoparticles by Green Synthesis Method and its Application in Water Treatment
Green Biosynthesis of Zinc Oxide Nanoparticles Utilizing Pomegranate Peel Extract for Grey Water Treatment
Design and Implementation of Montmorillonite Clay-Based Catalyst for Carbon Nanotube Synthesizing
Heptachlor Epoxide -Pesticide- Removal from Aqueous Solutions Using Nano Zero Valent Iron: Operating Conditions, Response Surface Methodology, and Artificial Intelligence Neural Networks
Chapter 2: Semiconductor Wafer Fabrication
High-Speed Plasma Etching of Gallium Oxide Substrates Using Atmospheric-Pressure Plasma with Hydrogen-Helium Mixed Gas
Transport Phenomena during Liquid Si-Induced 4H-SiC Surface Structuring in a Sandwich Configuration
Surface-Localized 15R Formation on 4H-SiC (0001) Si-Face by Laser Annealing for Power N-Type MOSFETs
Exploring UV-Laser Effects on Al-Implanted 4H-SiC
Benchmarking Experiment of Substrate Quality including SmartSiCTM Wafers by Epitaxy in a Batch Reactor
Optimizing Non-Contact Doping and Electrical Defect Metrology for Production of SiC Epitaxial Wafers
Quality Evaluation of 150 mm 4H-SiC Grown at over 1.5 mm/h by High-Temperature Chemical Vapor Deposition Method
Deep Level Reduction in 4H-SiC Treated by Plasma Immersion
Improving the Polishing Speed and Surface Quality of 4H-SiC Wafers with an MnO2- Based Slurry
Chapter 3: Coatings and Tribology
Preparation, Characterization and Tribological Performance of Polyurethane (PU) Coatings Filled with Graphene Oxide (GO)
Brush Plating of Ag-Bi Coatings from a Cyanide-Free Solution
Effect of Alternate Cycle Temperature on the Tribological Performance of Polyimide Composites