Mittal Particles on Surfaces: Detection, Adhesion and Removal, Volume 9

Erscheinungsjahr 2006
ISBN: 978-90-474-1822-1
Verlag: Taylor & Francis
Format: PDF
Kopierschutz: Adobe DRM (»Systemvoraussetzungen)

E-Book, Englisch, 500 Seiten

This volume chronicles the proceedings of the 9th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal held in Philadelphia, PA, June 2004.
The study of particles on surfaces is crucially important in a legion of diverse technological areas, ranging from microelectronics to biomedical to space.
This volume contains a total of 21 papers covering many ramifications of particles on surfaces, ranging from detection to removal. All manuscripts were rigorously peer-reviewed and revised, and properly edited before inclusion in this book.
The topics covered include: imaging and analysis of macro and nanosize particles and surface features; determination of particles on surfaces; laser inactivation on surfaces; laser-assisted nanofabrication on surfaces; post-CMP cleaning process; pre-gate cleaning; solar panel obscuration in the Martian atmosphere; adhesion and friction of microsized particles; microroughness of textile fibers and capture of particles; factors affecting particle adhesion and removal; various techniques for cleaning or removal of particles from different substrates including laser, combination of laser-induced shockwave and explosive vaporization of liquid, attenuated total internal reflection of laser light, CO2 snow, use of dense phase fluids, use of surfactants and impinging air jet; and removal of sub-100-nm particles.

Zielgruppe

This volume and its predecessors containing bountiful information on various ramifications of particles on surfaces provide a unified and comprehensive reference source, for anyone interested or involved (centrally or peripherally) in any aspect of particles on surfaces.

Autoren/Hrsg.

Mittal, Kash L.

Fachgebiete

• Naturwissenschaften Chemie Physikalische Chemie

Inhaltsverzeichnis

Preface
Part 1: Particle Detection/Analysis/Characterization and General
Cleaning-Related Topics
Recent developments in imaging and analysis of micro- and nanosize particles and surface features
R. Kohli
Photodigital imaging as a means of monitoring particulate contamination on surfaces
R. Kaiser, J. Grilly and A. Kulczyk
Determination of residual particles on surfaces. An updated method for particle extraction using ultrasonics
S. B. Awad
Laser inactivation of surfaces and detection of bacteria
I. A. Watson, D. E. S. Stewart-Tull, R. Parton, I. Peden, A. Yeo, B. K. Tan and G. Ward
Laser-assisted nanofabrication on surfaces using micro- and nanoparticles
Y. F. Lu, L. P. Li, K. K. Mendu, J. Shi, D. W. Doerr and D. R. Alexander
Clean-then-assemble versus assemble-then-clean: Several comparisons
R. W. Welker
Development of a non-contact post-CMP cleaning process for copper
D. A. Koos, J. Svirchevski, D. J. Vitkavage, D. G. Hansen, K. A. Reinhardt, F. Huang, M. Mitchel and G. Zhang
Using ozonated DI water for pre-gate cleaning
L. Liu, I. Kashkoush, A. Walter and R. Novak
Decontamination of surrogate Pu-238 legacy wastes
R. Kaiser, J. Desrosiers and A. Kulczyk
Solar panel obscuration by dust and dust mitigation in the Martian atmosphere
M. K. Mazumder, A. S. Biris, C. E. Johnson, C. U. Yurteri, R. A. Sims, R. Sharma, K. Pruessner, S. Trigwell and J. S. Clements
Part 2: Particle Adhesion and Removal
Adhesion and friction of single micrometer-sized particles
M. Kappl, L. Heim, S. Ecke, M. Farshchi and H. J. Butt
The effect of laser-induced micro-roughness of textile fibers on adhesion and capture of micrometer-sized particles
T. Bahners, K. Opwis, T. Textor, W. Labuda and E. Schollmeyer
Advances in wafer cleaning and particle removal technology
K. A. Reinhardt
Particle removal challenges and solutions in semiconductor fabrication CMP processes
M. T. Andreas
Laser cleaning of model sub-micrometer particulate contaminants from Si surfaces
S. I. Kudryashov, S. D. Shukla and S. D. Allen
Removal of particles using the combined effect of laser-induced shock wave and explosive vaporization of liquid
D. Jang and D. Kim
Particle removal by attenuated total internal reflection of laser light
G. Dubé, A. J. Braundmeier, Jr. and J. D. Kelley
Removal of sub-100-nm particles from structured substrates with CO2 snow
J. C. J. van der Donck, R. Schmits, R. E. van Vliet and Ton (A.) G. T. M. Bastein
Particle removal by dense-phase fluids using ultrasonics
W. T. McDermott, G. Parris, D. V. Roth and C. J. Mammarella
Prediction of particle removal using surfactants
M. L. Free
Removal of micrometer-size particles from solid surfaces by an impinging air jet
K. Gotoh