Nanolithography and Surface Microscopy with Electron Beams

Erscheinungsjahr 2024
ISBN: 978-0-443-31462-9
Verlag: Elsevier Science & Technology

Buch, Englisch, Format (B × H): 152 mm x 229 mm, Gewicht: 450 g

Nanolithography and Surface Microscopy with Electron Beams, Volume 231 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains. Specific chapters cover Introduction to inverse problems in electron microscopy, Directional sinogram inpainting for limited angle tomography, Strain tomography of crystals, FISTA with adaptive discretization, Total variation discretization, and Reconstruction with a Gaussian Dictionary.

Autoren/Hrsg.

Weitere Mitwirkende

Hawkes, Peter W.

Fachgebiete

• Technische Wissenschaften Sonstige Technologien | Angewandte Technik Angewandte Optik
• Naturwissenschaften Physik Elektromagnetismus Elektrizität, Elektrodynamik
• Technische Wissenschaften Maschinenbau | Werkstoffkunde Maschinenbau
• Technische Wissenschaften Elektronik | Nachrichtentechnik Elektronik
• Technische Wissenschaften Elektronik | Nachrichtentechnik Nachrichten- und Kommunikationstechnik Signalverarbeitung
• Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde

Inhaltsverzeichnis

Introduction and Summary
Lord Broers
1. Early life
Lord Broers
2. Modification of an SEM/Ion beam system to improve the resolution and reliability of the SEM and remove oxygen ions from the ion beam
Lord Broers
3. Formation of cones and ridges on ion-etched surfaces
Lord Broers
4. Microfabrication in an SEM
Lord Broers
5. High Resolution Short Focal Length Lens Electron Probe
Lord Broers
6. Low-Loss Surface Microscopy in short focal length Probe
Lord Broers
7. Microfabrication in the 5Å electron probe
Lord Broers
8. Nanodevices fabricated in the HR Probe
Lord Broers
9. Fabrication of Structures with Dimensions Below 10 nm
Lord Broers
10. Semiconductor Lithography and Processing
Lord Broers
11. Nanolithography at 400kV
Lord Broers
12. Last twenty years and future of semiconductor chips
Lord Broers

Über Autor(innen)

Hawkes, Peter W.
Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 - 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.