Design for Manufacturability with Advanced Lithography

1. Auflage 2016
ISBN: 978-3-319-20384-3
Verlag: Springer International Publishing

Buch, Englisch, 164 Seiten, HC runder Rücken kaschiert, Format (B × H): 160 mm x 241 mm, Gewicht: 3908 g

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

Zielgruppe

Research

Autoren/Hrsg.

Pan, David Z.

Yu, Bei

Fachgebiete

• Technische Wissenschaften Elektronik | Nachrichtentechnik Elektronik Schaltungsentwurf
• Technische Wissenschaften Maschinenbau | Werkstoffkunde Produktionstechnik Fertigungstechnik

Inhaltsverzeichnis

Introduction.- Layout Decomposition for Triple Patterning.- Layout Decomposition for Other Patterning Techniques.- Standard Cell Compliance and Placement Co-Optimization.- Design for Manufacturability with E-Beam Lithography.- Conclusions and Future Works.-