Low-Energy Ion Irradiation of Materials

Fundamentals and Application
1. Auflage 2022
ISBN: 978-3-030-97276-9
Verlag: Springer International Publishing

Buch, Englisch, 754 Seiten, Format (B × H): 160 mm x 241 mm, Gewicht: 1462 g

Reihe: Springer Series in Materials Science

This book provides a comprehensive introduction to all aspects of low-energy ion–solid interaction from basic principles to advanced applications in materials science. It features a balanced and insightful approach to the fundamentals of the low-energy ion–solid surface interaction, focusing on relevant topics such as interaction potentials, kinetics of binary collisions, ion range, radiation damages, and sputtering. Additionally, the book incorporates key updates reflecting the latest relevant results of modern research on topics such as topography evolution and thin-film deposition under ion bombardment, ion beam figuring and smoothing, generation of nanostructures, and ion beam-controlled glancing angle deposition. Filling a gap of almost 20 years of relevant research activity, this book offers a wealth of information and up-to-date results for graduate students, academic researchers, and industrial scientists working in these areas.

Zielgruppe

Graduate

Autoren/Hrsg.

Rauschenbach, Bernd

Fachgebiete

• Naturwissenschaften Physik Quantenphysik Kernphysik
• Naturwissenschaften Physik Quantenphysik Atom- und Molekülphysik
• Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Materialwissenschaft: Biomaterialien, Nanomaterialien, Kohlenstoff
• Technische Wissenschaften Verfahrenstechnik | Chemieingenieurwesen | Biotechnologie Technologie der Oberflächenbeschichtung

Inhaltsverzeichnis

1. Introduction.- 2. Collision processes.- 3. Energy-loss processes and ion range.- 4. Ion beam induced damage.- 5. Sputtering.- 6. Evolution of topography under low-energy ion bombardment.- 7. Ion beam figuring and smoothing.- 8. Ion beam deposition.- 9. Ion beam assisted deposition.- 10. Ion beam sputtering induced glancing angle deposition.

Über Autor(innen)

Prof. Dr. Dr. h.c. Bernd Rauschenbach studied physics at the Martin-Luther-University Halle-Wittenberg, Germany. Before coming to the Technical University Hamburg as professor in 1990, he was a staff physicist at the Central Institute of Nuclear Research Dresden-Rossendorf for 16 years. During that time, he obtained his first doctoral degree (Dr. rer. nat.) and the second doctoral degree (Dr. sc. nat.) from the Academy of Science. Since 1993 he has been Professor of experimental physics at the University Augsburg. In 2000, he was appointed to Director and Executive Chairman of the Leibniz Institute of Surface Modification (IOM) Leipzig and Professor of applied physics at the Felix Bloch Institute for Solid State Physics of the University Leipzig.

His research interests are focused on the study of ion-solid interaction, laser ablation, nanomaterials and the transfer of achieved results to industry. Prof. Rauschenbach authored and coauthored close to 600 peer-reviewed scientificpublications, 28 patents and two book chapters. Professor Rauschenbach was a member of several committees and boards, including reviewer of the Physics of the Condensed Matter Council of the German Science Foundation (DFG), speaker of the Thin Film Division of the German Physical Society (DPG) and member of the board “Innovation and Science”.