E-Book, Englisch, 850 Seiten
Smith / Suzuki Microlithography
3. Auflage 2017
ISBN: 978-1-4398-7676-3
Verlag: CRC Press
Format: PDF
Kopierschutz: Adobe DRM (»Systemvoraussetzungen)
Science and Technology, Third Edition
E-Book, Englisch, 850 Seiten
ISBN: 978-1-4398-7676-3
Verlag: CRC Press
Format: PDF
Kopierschutz: Adobe DRM (»Systemvoraussetzungen)
Like the bestselling original, this second edition of Microlithography is a self-contained text detailing both elementary and advanced aspects of submicron microlithography, offering a balanced treatment of theoretical and operating practices. Reflecting recently developed technologies, this edition includes coverage of immersion lithography, extreme ultraviolet (EUV) lithography, imprint lithography, photoresists for 193nm and immersion lithography, and scatterometry. The authors cover mechanical systems, optics, excimer laser light sources, and alignment techniques and analysis, as well as resist chemistry, processing, multilayer lithography, plasma and reactive ion etching, and metrology.
Autoren/Hrsg.
Fachgebiete
Weitere Infos & Material
EXPOSURE SYSTEM
System Overview of Optical Steppers and Scanners; Michael S. Hibbs
Optical Lithography Modeling; Chris A. Mack
Optics for Photolithography; Bruce W. Smith
Excimer Laser for Advanced Microlithography; Palash Das
Alignment and Overlay; Gregg M. Gallatin
Electron Beam Lithography System; Kazuaki Suzuki
X-Ray Lithography; Takumi Ueno
EUV Lithography; Stefan Wurm and Charles Gwyn
Imprint Lithography; Douglas J. Resnick
RESISTS AND PROCESSING
Chemistry of Photoresist Materials; Takumi Ueno and Robert D. Allen
Resist Processing; Bruce W. Smith
Multilayer Resist Technology; Bruce W. Smith and Maureen Hanratty
Dry Etching of Photoresists; Roderick R. Kunz
METROLOGY AND NANOLITHOGRAPHY
Critical-Dimensional Metrology for Integrated-Circuit Technology; Herschel M. Marchman, Gian Lorusso, Mike Adel, and Sanjay Yedur
Electron Beam Nanolithography; Elizabeth A. Dobisz, Zvonimir Z. Bandic, and Martin C. Peckerar
Index
