Principles of Chemical Vapor Deposition

1. Auflage. Softcover version of original hardcover Auflage 2003
ISBN: 978-90-481-6277-2
Verlag: Springer Netherlands

Buch, Englisch, 273 Seiten, Previously published in hardcover, Format (B × H): 155 mm x 235 mm, Gewicht: 441 g

Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment.

This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.

Zielgruppe

Research

Autoren/Hrsg.

Zuraw, M. K.

Dobkin, D.M.

Fachgebiete

• Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Werkstoffprüfung
• Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Werkstoffkunde, Materialwissenschaft: Forschungsmethoden
• Technische Wissenschaften Verfahrenstechnik | Chemieingenieurwesen | Biotechnologie Metallurgie
• Technische Wissenschaften Maschinenbau | Werkstoffkunde Produktionstechnik Werkzeugbau
• Technische Wissenschaften Technik Allgemein Technik: Allgemeines
• Naturwissenschaften Physik Quantenphysik Kernphysik
• Technische Wissenschaften Verfahrenstechnik | Chemieingenieurwesen | Biotechnologie Verfahrenstechnik, Chemieingenieurwesen

Inhaltsverzeichnis

1. Introduction.- 2. Reactors Without Transport.- 3. Mass Transport.- 4. Heat Transport.- 5. Chemistry for CVD.- 6. Gas Discharge Plasmas For CVD.- 7. CVD Films.- 8. CVD Reactors.