Sonstiges, Englisch, 186 Seiten, Format (B × H): 125 mm x 142 mm, Gewicht: 200 g
Sonstiges, Englisch, 186 Seiten, Format (B × H): 125 mm x 142 mm, Gewicht: 200 g
ISBN: 978-3-908454-25-0
Verlag: Trans Tech Publications
Volume is indexed by Thomson Reuters CPCI-S (WoS).
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Weitere Infos & Material
Stress and Intermixing in Epitaxial Ni(111)/Mo(110) SuperlatticesRedistribution of Implanted Species in Polycrystalline Silicon Films on Silicon Substrate Investigating Interdiffusion in Mo/V Multilayers from X-Ray Scattering and Kinetic Simulations Intermixing in Cu/Co: Molecular Dynamics Simulations and Auger Electron Spectroscopy Depth Profiling Simultaneous Measurement of Tracer Jump Frequencies on Different Sublattices in Ga7Pd3 Using PAC Dopant Diffusion during Amorphous Silicon Crystallization Grain Boundary Surface Tension, Segregation and Diffusion in Cu-Sn System The Stress Field in Cu-Fe-Ni Diffusion CouplesEffect of Morphology on the Mobility of Nanosized Liquid Pb Inclusions in Solid Al Nonlinear Field Theory of the Stress Induced Interdiffusion and Mass Transport Stress Evolution in Thin Films; Diffusion and ReactionsCross Diffusion-Stresses EffectsNanoscale Effects in InterdiffusionDiffusion-Induced Stresses: Theory and ApplicationsNonequilibrium Vacancies in Nanosystems Nonlinear Stress Effects in DiffusionStress Relaxation Mechanisms during Cd21Ni5 Intermetallic Growth under High Hydrostatic Pressure Thermal and Mechanical Stability of Polycrystalline NanowiresOn the Role of Stress, Strain and Diffusion in Dissolution ? Condensation Mechanism of Liquid Metal Embrittlement Diffusion of Implanted Metals in Tantalum SilicideSolid-State Reactions in Ni(10 nm)/C(2 nm)/Si(001) Thin Film System Influence of Annealing Environment and Film Thickness on the Phase Formation in the Ti/Si(100) and (Ti +Si)/Si(100) Thin Film Systems Study of Diffusion and Reaction Diffusion in the Fe-C-Nb SystemOn the Local Equilibrium during Dissolution of a Thin Film