Extreme Ultraviolet Lithography

Erscheinungsjahr 2020
ISBN: 978-1-5106-3939-3
Verlag: SPIE Press

Buch, Englisch, 245 Seiten, Paperback

Reihe: SPIE Press Monographs

This book covers the many aspects of lithographic technology that needed to be addressed in order to make EUV lithography ready for high-volume manufacturing: exposure tools, light sources, masks, resists, process control, metrology, and computational lithography. Lithography costs, which have often influenced the areas of technical focus, are discussed. Potential improvements to current EUV technology and extensions to future nodes are also covered. Each topic is approached from the perspective of a practicing lithographer in a wafer fab, in either manufacturing or development, and there are many references at the end of each chapter.

Autoren/Hrsg.

Fachgebiete

• Technische Wissenschaften Sonstige Technologien | Angewandte Technik Angewandte Optik

Inhaltsverzeichnis

- Introduction
- Sources of EUV Light
- EUV Exposure Systems
- EUV Masks
- EUV Resists
- Computational Lithography for EUV
- Process Control for EUV Lithography
- Metrology for EUV Lithography
- EUV Lithography Costs
- Extending EUV Lithography