Buch, Englisch, Band 264, 216 Seiten, Paperback, Format (B × H): 155 mm x 235 mm, Gewicht: 353 g
Reihe: NATO Science Series E:
A Borderland between STM, EB, IB, and X-Ray Lithographies
Buch, Englisch, Band 264, 216 Seiten, Paperback, Format (B × H): 155 mm x 235 mm, Gewicht: 353 g
Reihe: NATO Science Series E:
ISBN: 978-90-481-4388-7
Verlag: Springer Netherlands
Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography.
Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).
Zielgruppe
Research
Autoren/Hrsg.
Fachgebiete
- Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Materialwissenschaft: Verbundwerkstoffe
- Technische Wissenschaften Elektronik | Nachrichtentechnik Elektronik Mikroprozessoren
- Naturwissenschaften Physik Thermodynamik Oberflächen- und Grenzflächenphysik, Dünne Schichten
- Naturwissenschaften Physik Thermodynamik Festkörperphysik, Kondensierte Materie
- Technische Wissenschaften Maschinenbau | Werkstoffkunde Produktionstechnik Fertigungstechnik
Weitere Infos & Material
Content.- Electron Beam Lithography.- Nanolithography, The Integrated System.- Electron Beam Resists and Pattern Transfer Methods.- Nanolithography Developed Through Electron-Beam-Induced Surface Reaction.- Direct Writing of Nanoscale Patterns in SiO2.- Sub-10 nm Electron Beam Lithography: -AlF-Doped Lithium Fluoride as a Resist.- Surface Imaging for EB-Nanolithography.- Patterning of InGaAs/GaAs Quantum Dots Using E-Beam Lithography and Selective Removal of the Top Barrier.- Fabrication of Ultrasmail InGaAslInP Nanostructures by High Voltage Electron Beam Lithography and Wet Chemical Etching.- Fabrication, Investigation and Manipulation of Artificial Nanostructures.- Nano-Lithography in 3 Dimensions with Electron Beam Induced Deposition.- Nanolithography Requirements — An Equipment Manufacturers View.- X-Ray Lithography.- X-Ray Nanolithography: Limits, and Applications to Sub-100 nm Manufacturing.- X-Ray Phase Shifting Masks.- Fabrication of X-Ray Mask for Nanolithography by EBL.- Ion Beam Lithography.- Intense Focused Ion Beams for Nanostructurisation.- Latest Results Obtained with the Alpha Ion Projection Machine.- STM Lithography.- Direct Writing with a Combined STM/SEM System.- Low Voltage E-Beam Lithography with the Scanning Tunneling Microscope.- STM Nanolithography and Characterization of Passivated Silicon and Gallium Arsenide.- Sub-20 nm Lithographic Patterning with the STM.- Lithography of YBa2Cu3O7 Superconducting Thin Films with a Scanning Tunneling Microscope.- Author Index.
