Advances in Imaging and Electron Physics

Electron Emission Physics
Erscheinungsjahr 2007
ISBN: 978-0-12-374207-0
Verlag: William Andrew Publishing

Buch, Englisch, 360 Seiten, Format (B × H): 152 mm x 229 mm, Gewicht: 700 g

Advances in Imaging and Electron Physics merges two long-running serials-Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.

This thematic volume is on the topic of "Field-emission Source Mechanisms" and is authored by Kevin Jensen, Naval Research Laboratory, Washington, DC.

Zielgruppe

Physicists, electrical engineers and applied mathematicians in all branches of image processing and microscopy as well as electron physics in general

Autoren/Hrsg.

Jensen, Kevin

Weitere Mitwirkende

Hawkes, Peter W.

Fachgebiete

• Technische Wissenschaften Sonstige Technologien | Angewandte Technik Angewandte Optik
• Technische Wissenschaften Technik Allgemein Physik, Chemie für Ingenieure
• Technische Wissenschaften Elektronik | Nachrichtentechnik Nachrichten- und Kommunikationstechnik Optische Nachrichtentechnik
• Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Materialwissenschaft: Elektronik, Optik

Inhaltsverzeichnis

I. FIELD AND THERMIONIC EMISSION FUNDAMENTALSA. A Note On UnitsB. Free Electron GasC. Nearly Free Electron GasD. The Surface Barrier to Electron EmissionE. The Image Charge ApproximationII. THERMAL AND FIELD EMISSIONA. Current DensityB. Exactly Solvable ModelsC. WKB "Area Under the Curve� ModelsD. Numerical MethodsE. The Thermal and Field Emission EquationF. The Revised FN-RLD Equation and the inference of Work Functionfrom experimental dataG. Recent Revisions of the Standard Thermal an Field ModelsH. The General Thermal-Field EquationI. Thermal EmittanceIII. PHOTOEMISSIONA. BackgroundB. Quantum EfficiencyC. The Probability of emissionD. Reflection and Penetration DepthE. ConductivityF. Scattering RatesG. Scattering factorH. Temperature of a Laser-illuminated SurfaceI. Numerical Solution of the Coupled Thermal EquationsJ. Revisions to the Modified Fowler Dubridge Model: Quantum EffectsK. Quantum Efficiency Revisited: A Moments-based ApproachL. The Quantum Efficiency of Bare MetalsM. The Emittance and Brightness of PhotocathodesIV. LOW WORK FUNCTION COATINGS AND ENHANCED EMISSIONA. Some HistoryB. A Simple Model of a Low Work Function CoatingC. A Less Simple Model of the Low Work Function CoatingD. The (Modified) Gyftopoulos-Levine Model of Work FunctionReductionE. Comparison of the Modified Gyftopoulos-Levine Model toThermionic DataF. Comparison of the Modified Gyftopoulos-Levine Model toPhotoemission DataV. APPENDICESA. Integrals related to Fermi-Dirac and Bose-Einstein StatisticsB. The Riemann Zeta function

Über Autor(innen)

Hawkes, Peter W.
Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 - 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.