Kohli / Mittal Developments in Surface Contamination and Cleaning - Vol 5

Contaminant Removal and Monitoring
1. Auflage 2012
ISBN: 978-1-4377-7882-3
Verlag: William Andrew Publishing
Format: EPUB
Kopierschutz: 6 - ePub Watermark

E-Book, Englisch, 240 Seiten

In this series, Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or dealing with the consequences of surface contamination.

This volume complements Volumes 3 and 4 of this series, which focused largely on particulate contaminants. The expert contributions in this volume cover methods for removal of non-particulate contaminants, such as metallic and non-metallic thin films, hydrocarbons, toxic and hazardous chemicals, and microbiological substances, as well as contamination monitoring in pharmaceutical manufacturing, and an innovative method for characterization at the nanoscale.

Feature: Comprehensive coverage of innovations in surface contamination and cleaning

Benefit: One-stop series where a wide range of readers will be sure to find a solution to their cleaning

problem, saving the time involved in consulting a range of disparate sources.

Feature: Written by established experts in the contamination and cleaning field

Benefit: Provides an authoritative resource

Feature: Each chapter is a comprehensive review of the state of the art.

Benefit: Can be relied on to provide insight, clarity and real expertise on up-to-the-minute

innovations.

Feature: Case studies included

Benefit: Case studies help the reader see theory applied to the solution of real-world practical cleaning

and contamination problems.

Zielgruppe

<p>As a whole, the series will create a unique and comprehensive knowledge base of crucial importance to those in research & development, manufacturing, quality control and procurement specifications in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Researchers in an academic setting will also find these volumes excellent source books. </p>

Autoren/Hrsg.

Kohli, Rajiv

Mittal, Kashmiri L.

Fachgebiete

• Technische Wissenschaften Verfahrenstechnik | Chemieingenieurwesen | Biotechnologie Technologie der Chemischen Reinigungsmittel
• Technische Wissenschaften Verfahrenstechnik | Chemieingenieurwesen | Biotechnologie Technologie der Oberflächenbeschichtung

Inhaltsverzeichnis

- Surface Contamination Removal Using Dense Phase Fluids: Liquid and Supercritical Carbon Dioxide

- Plasma Cleaning for Electronic, Photonic, Biological and Archeological Applications

- Cleanroom Wipers for Removal of Surface Contamination

- Impact of Microbial Surface Contamination and Effective Environment Monitoring System in Pharmaceutical Manufacturing

- Neutron Holography as a Technique for Probing Local Atomic Structures on the Nanoscale

Über Autor(innen)

Kohli, Rajiv
NASA Johnson Space Center -Rajiv Kohli is a leading expert in contaminant particle behaviour, surface cleaning and contamination control. At the NASA Johnson Space Center he has primary responsibility for contamination control related to spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program (designed to meet the United States Vision for Space Exploration). He helped to develop solvent-based cleaning applications for the nuclear industry and an innovative microabrasive system for a wide variety of applications in the commercial sector. He co-authored Commercial Utilization of Space: An International Comparison of Framework Conditions, and has published over 200 technical papers. His other specialisms include precision cleaning, solution and surface chemistry, advance materials and chemical thermodynamics. In 2005, Dr. Kohli received the Public Service Medal, one of NASA's highest awards, for contributions to the Space Shuttle Return to Flight project.

Mittal, Kashmiri L.
Editor: 'Reviews of Adhesion and Adhesives'

was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of adhesion science and technology and in surface contamination and cleaning. He is the founding editor of the Journal of Adhesion Science and Technology and is editor of 85 books, many of them dealing with surface contamination and cleaning. In 2002, the Kash Mittal Award was inaugurated for his extensive efforts and significant contributions to the field of colloid and interface chemistry. Among his numerous awards, Dr. Mittal was awarded the title honoris causa by the Maria Curie-Sklodowska University in Lubin, Poland in 2003.