Lu | Materials for Electronics: Silicon Carbide and Related Materials | Buch | 978-3-0357-1642-9 | sack.de

Buch, Englisch, 184 Seiten, Format (B × H): 170 mm x 240 mm, Gewicht: 450 g

Lu

Materials for Electronics: Silicon Carbide and Related Materials

Buch, Englisch, 184 Seiten, Format (B × H): 170 mm x 240 mm, Gewicht: 450 g

ISBN: 978-3-0357-1642-9
Verlag: Trans Tech Publications


These papers were selected from materials of the Asia-Pacific Conference on Silicon Carbide and Related Materials (APCSCRM 2019), July 17-20, 2019, Beijing, China. The collection introduces results of scientific and engineering researches in the area of growth, analysis of structure, and properties of wide bandgap semiconductors and of wide bandgap semiconductor devices.
Lu Materials for Electronics: Silicon Carbide and Related Materials jetzt bestellen!

Autoren/Hrsg.


Weitere Infos & Material


Preface
Chapter 1: Growth, Structure and Properties of Wide Bandgap Semiconductors
Elimination of Silicon Droplets Formation during 4H-SiC Epitaxial Growth by Chloride-Based CVD in a Vertical Hot-Wall Reactor
Synthesis of Diamond on SiC by Microwave Plasma Chemical Vapor Deposition: Comparison of Silicon-Face and Carbon-Face
High Temperature Annealing SP-AlN Ameliorates the Crystal Quality ofAl0.5Ga0.5N Regrowth
Epitaxial Growth of “Strain-Free” Indium Oxide Films on (111) Yttria-Stabilized Zirconia by Metal-Organic Chemical Vapor Deposition
Investigation of Solution-Processed Ga2O3 Thin Films and their Application in Dielectric Materials
The Influence of Tri-Defects of Epitaxial Layers on the Performance of 4H-Sic Diodes
Study on the Synthesis of SiC Powder Material by Using Induction Heating System
Low Surface Roughness GaAs/Si Thin-Film Deposition Using Three-Step Growth Method in MBE
Chapter 2: Fabrication, Properties and Application of Wide Bandgap Semiconductor Devices
Characteristics and Drive Design Analysis of SiC
SiC Trenched Schottky Diode with Step-Shaped Junction Barrier for Superior Static Performance and Large Design Window
Optimal Design of Large Signal and Noise Performance of GaN/SiC Hetero-Structural IMPATT Diodes Based on QCDD Model
Advances for Enhanced GaN-Based HEMT Devices with p-GaN Gate
Normally-Off GaN Power Device Based on Stack AlGaN Barrier Structure and P-Type NiO Gate Electrode
Design and Fabrication of 4H-Sic Mosfets with Optimized JFET and p-Body Design
The Effect on the Interface and Reliability of SiC MOS by Ar/O2 Annealing
A Study of the High-K Enhanced Depletion-JTE for Ultra-High Voltage SiC Power Device with Improved JTE-Dose Window
Design, Fabrication and Characterization of 10kV/100A 4H-SiC PiN Power Rectifier
Design and Fabrication of Non-Uniform Spacing Multiple Floating Field Limiting Rings for 6500V 4H-SiC JBS Diodes
Inserting a AlN Electron Blocking Layer for InGaN/GaN Blue Light-Emitting Diodes
Broadband Ultraviolet Photodetector Based on Graphene/ß-Ga2O3/GaN Heterojunction
Enhancement of Minority Carrier Lifetime in Ultra-High Voltage 4H-SiC PiN Diodes by Carbon-Film Annealing
Effect of the Field Oxidation Process on the Electrical Characteristics of 6500V 4H-SiC JBS Diodes
Research on VRM in RF PA System Based on Enhancement Mode GaN HEMT
Optimal Design of Large Signal Performance of AlN/GaN Hetero-Structural IMPATT and MITATT Diodes
Research of 3.3kV, 60A H-Bridge High-Voltage SiC Diode Modules


Ihre Fragen, Wünsche oder Anmerkungen
Vorname*
Nachname*
Ihre E-Mail-Adresse*
Kundennr.
Ihre Nachricht*
Lediglich mit * gekennzeichnete Felder sind Pflichtfelder.
Wenn Sie die im Kontaktformular eingegebenen Daten durch Klick auf den nachfolgenden Button übersenden, erklären Sie sich damit einverstanden, dass wir Ihr Angaben für die Beantwortung Ihrer Anfrage verwenden. Selbstverständlich werden Ihre Daten vertraulich behandelt und nicht an Dritte weitergegeben. Sie können der Verwendung Ihrer Daten jederzeit widersprechen. Das Datenhandling bei Sack Fachmedien erklären wir Ihnen in unserer Datenschutzerklärung.