Meichsner / Schmidt / Schneider Nonthermal Plasma Chemistry and Physics

Erscheinungsjahr 2012
ISBN: 978-1-4200-5921-2
Verlag: Taylor & Francis
Format: PDF
Kopierschutz: Adobe DRM (»Systemvoraussetzungen)

E-Book, Englisch, 564 Seiten

In addition to introducing the basics of plasma physics, Nonthermal Plasma Chemistry and Physics is a comprehensive presentation of recent developments in the rapidly growing field of nonthermal plasma chemistry. The book offers a detailed discussion of the fundamentals of plasma chemical reactions and modeling, nonthermal plasma sources, relevant diagnostic techniques, and selected applications.

Elucidating interconnections and trends, the book focuses on basic principles and illustrations across a broad field of applications. Expert contributors address environmental aspects of plasma chemistry. The book also includes selected plasma conditions and specific applications in volume plasma chemistry and treatment of material surfaces such as plasma etching in microelectronics, chemical modification of polymer surfaces and deposition of functional thin films. Designed for students of plasma physics, Nonthermal Plasma Chemistry and Physics is a concise resource also for specialists in this and related fields of research.

Zielgruppe

Researchers in plasma chemistry, plasma physics, and the development of plasma technology.

Autoren/Hrsg.

Meichsner, Jurgen

Schmidt, Martin

Schneider, Ralf

Wagner, Hans-Erich

Fachgebiete

• Naturwissenschaften Physik Angewandte Physik Chemische Physik
• Naturwissenschaften Chemie Physikalische Chemie
• Naturwissenschaften Physik Thermodynamik Plasmaphysik

Inhaltsverzeichnis

Introduction
Nonthermal Plasma Chemical Processes of General Interest
Physics of Nonthermal Plasmas
Nonthermal Plasma Chemical Reactors
Elementary Processes on Surfaces in Plasma–Wall Interaction
Plasma Diagnostics
Surface and Thin Film Analysis
Selected Applications
Modeling and Simulation
Trends and New Concepts