Mittal Particles in Gases and Liquids 1

Detection, Characterization, and Control
1989
ISBN: 978-1-4613-0793-8
Verlag: Springer US
Format: PDF
Kopierschutz: 1 - PDF Watermark

E-Book, Englisch, 312 Seiten, eBook

This book documents the proceedings of the Symposium on Particles in Fluids: Detection, Characterization and Control held as a part of the 18th Fine Particle Society meeting in Boston, August 3-7, 1987. This was the Premier symposium on this topic and the response was so good that we have decided to organize it on a biennial basis and the second symposium will be held under the rubric Particles in Gases and Liquids: Detection, Characterization and Control at the 20th Fine Particle Society meeting in Boston, August 22-26, 1989. In the modern manufacture of sophisticated and sensitive microelectronic components and other precision parts, there has been a great deal of concern about yield losses due to micrometer- and submicrometer-sized particles. These particles can originate from a number of sources including fluids, i. e. , gases and liquids used in the manufacturing process. So the detection, characterization and control or removal of these undesirable particles is of cardinal importance and this symposium was conceived and o~ganized with this in mind. The purposes of this symposium were to bring together those actively involved in all aspects of particles in fluids, to provide a forum for discussion of the latest techniques for the detection, characterization and control of particles, and to highlight areas which needed intensified R&D efforts. The printed program contained a total of 46 papers and a variety of topics dealing with various ramifications of particles in fluids were presented.

Zielgruppe

Research

Autoren/Hrsg.

Mittal, K.L.

Inhaltsverzeichnis

Monitoring Contaminant Particles in Gases and Liquids: A Review.- Measuring and Identifying Particles in Ultrapure Water.- Non-Poisson Models of Particle Counting.- Liquid Particle Counter Comparison.- Particle Counting of Liquid Systems using a Scanning Electron Microscope.- Improved Methodology for Measurement of Particle Concentrations in Semiconductor Process Chemicals.- Calibration of the Photo-sedimentometer LUMOSED with a Powder of Known Particle Size Distribution.- Particle Contamination Control and Measurement in Ultra-pure VLSI Grade Inert Gases.- Design and Practical Considerations in Using Cascade Impactors to Collect Particle Samples from Process Gases for Identification.- In-situ Monitoring of Particulate Contamination in Integrated Circuit Process Equipment.- A Real-time Fallout Monitor for 5–250 Micrometer Particles.- Measurement and Control of Particle-Bearing Air Currents in a Vertical Laminar Flow Clean Room.- Particle Deposition Velocity Studies in Silicon Technology.- Influence of Particle Charge on the Collection Efficiency of Electrified Filter Mats.- Particle Retention and Downstream Cleanliness of Point-of-use Filters for Semiconductor Process Gases.- A Fluid Dynamic Study of a Microcontaminant Particles Removal Process.- Particle Removal from Semiconductor Wafers using Cleaning Solvents.- Particle Contributions of Three Types of Cleanroom Jumpsuits.- Particle Generation in Devices used in Clean Manufacturing.- About the Contributors.