Buch, Englisch, 212 Seiten, Format (B × H): 156 mm x 234 mm, Gewicht: 333 g
Reihe: Engineering Materials
Theory and Fractal Descriptions
Buch, Englisch, 212 Seiten, Format (B × H): 156 mm x 234 mm, Gewicht: 333 g
Reihe: Engineering Materials
ISBN: 978-0-367-51360-3
Verlag: CRC Press
Sputtered Thin Films: Theory and Fractal Descriptions provides an overview of sputtered thin films and demystifies the concept of fractal theory in analysis of sputtered thin films. It simplifies the use of fractal tools in studying the growth and properties of thin films during sputtering processes. Part 1 of the book describes the basics and theory of thin film sputtering and fractals. Part 2 consists of examples illustrating specific descriptions of thin films using fractal methods.
- Discusses thin film growth, structure, and properties
- Covers fractal theory
- Presents methods of fractal measurements
- Offers typical examples of fractal descriptions of thin films grown via magnetron sputtering processes
- Describes application of fractal theory in prediction of thin film growth and properties
This reference book is aimed at engineers and scientists working across a variety of disciplines including materials science and metallurgy as well as mechanical, manufacturing, electrical, and biomedical engineering.
Autoren/Hrsg.
Fachgebiete
- Naturwissenschaften Chemie Physikalische Chemie Chemische Kristallographie
- Technische Wissenschaften Verfahrenstechnik | Chemieingenieurwesen | Biotechnologie Metallurgie
- Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde
- Technische Wissenschaften Verfahrenstechnik | Chemieingenieurwesen | Biotechnologie Verfahrenstechnik, Chemieingenieurwesen
- Technische Wissenschaften Verfahrenstechnik | Chemieingenieurwesen | Biotechnologie Technologie der Oberflächenbeschichtung
Weitere Infos & Material
Part 1. Theory. 1. Thin Film Growth, Structure, and Properties. 2. Fractal Theory. 3. Methods of Fractal Measurements. Part 2. Typical Studies of Fractal Descriptions of Sputtered Films. 4. Fractal Characterization of Hillocks and Porosity in Sputtered Films. 5. Fractal Analyses of Roughness of Sputtered Films. 6. Multifractal Characterization of Structure Evolution with Sputtering Parameters of Thin Films. 7. Fractal Prediction of Film Growth and Properties.
