Sangster | Formation of Silicon Nitride | Buch | 978-0-87849-492-7 | sack.de

Buch, Englisch, 960 Seiten, Format (B × H): 170 mm x 240 mm, Gewicht: 2000 g

Sangster

Formation of Silicon Nitride


From the 19th to the 21st Century

Buch, Englisch, 960 Seiten, Format (B × H): 170 mm x 240 mm, Gewicht: 2000 g

ISBN: 978-0-87849-492-7
Verlag: Trans Tech Publications

The elements: Si, N, O, C and H, have strong chemical affinities for one another. Under the correct conditions, Si-N bonding will occur in almost any Si-N-(O/C/H), and many related, reaction systems; although Si-O and Si-C are formidable competitors to Si-N. The most favored Si-N compound is stoichiometric Si3N4. It comes in three common varieties. How they interrelate, how one finds them and (above all ) how one makes them - and how sometimes they just happen to form - are the subjects of this book, with due attention being paid to closely related matters.
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Autoren/Hrsg.

Sangster, Raymond C.

Fachgebiete

Weitere Infos & Material

Dedication


Preface


CONTENTS


Acronyms and Abbreviations

Part A. In the Beginning. Chapter A-1. From the Cosmic to the Mundane
Chapter A-2. Book Purpose and Design, Writing Conventions
Chapter A-3. Historical Comments re Silicon Nitride Studies
Chapter A-4. Natural Occurrence of Si3N4
Chapter A-5. Major Reviews on Formation of Silicon Nitride
Part B. Technical Context of Silicon Nitride Formation
Chapter B-1. The Si-N System
Chapter B-2. Si3N4 Phases and Crystallography
Chapter B-3. Phase Chemistry of a-Si3N4 – "-Si3N4 – $-Si3N4
Chapter B-4. High Pressure Phase Chemistry of Si3N4
Chapter B-5. Silicon Nitride Solid Solutions
Chapter B-6. Phase Diagram Sources for Si3N4 & SiAlON Ceramic Systems
Chapter B-7. Thermodynamics of Si3N4
Chapter B-8. Self-Diffusion in Si3N4
Chapter B-9. Compositional and Phase Analysis of Si3N4
Chapter B-10. Si3N4 Toxicology and Safety
Chapter B-11. Engineering Aspects of Silicon Nitride Production
Chapter B-12. General Comments on Formation Chemistry of Silicon Nitride
Pat C. Si3N4 Products, Uses and Markets
Chapter C-1. Survey of Applications and Markets for Si3N4 Materials
Chapter C-2. Sintered Silicon Nitride Ceramics
Chapter C-3. Overview of Production of Silicon Nitride Powders
Chapter C-4. Overview of Si3N4 Whiskers, Fibers, and Filaments
Chapter C-5. Overview: Si3N4 Films, Coatings, Membranes, Massive CVD
Chapter C-6. Si3N4 Products by Transformation of Si3N4 Source Materials
Illustrative Applications I: SRBSN in Automotive Technology.
Part D. Si3N4 by Reaction of Si(cr) Surfaces and N-Species
Chapter D-1. Comments re Si(s,R,g)/N-Species Preparative Reactions
Chapter D-2. Si3N4 from Si(cr/Surface) /N2(g)
Chapter D-3. Si3N4 from Si(cr)/Activated Nitrogen
Chapter D-4. Si(cr)/N-Ions I. Basic Phenomena of Si3N4 Formation
Chapter D-5. Si(cr)/N-Ions II. Ion Plating of Si3N4 Surface Films
Chapter D-6. Si(cr)/N-Ions III. Ion Implantation of Buried Si3N4 Layers
Part E. Si3N4 Powder Formation from Si(Powder)/N2(g)
Chapter E-1. Basic Phenomena in Si3N4 Formation via Si(Powder)/N2(g)
Chapter E-2. Si3N4 Powder from Si(powder)/N2/(Impurities & Additives)
Chapter E-3. Preparation of Si3N4 Powder via Si(powder)/N2
Illustrative Applications II: SRBSN in Modern Diesel Engines.
Part F. Fabrication of Reaction Bonded Silicon Nitride
Chapter F-1. RBSN Introduction and Summation
Chapter F-2. Reaction Bonded Silicon Nitride Basics
Chapter F-3. RBSN Si Powder Effects and Processing
Chapter F-4. RBSN Green Shape Effects, Forming, Presintering, Machining
Chapter F-5. RBSN Nitridation
Chapter F-6. RBSN Product-Process Observations
Chapter F-7. RBSN Coating and Impregnation
Chapter F-8. Variant Versions of Reaction Bonded Si3N4
Chapter F-9. Doped/Filled/Reinforced RBSN Ceramics
Chapter F-10. SRBSN: Post-Sintering of RBSN
Part G. Si3N4 from Si/N2 Under Vigorous Conditions
Chapter G-1. Si3N4 Formation via Si(R)/N2 Reactions
Chapter G-2. Si(powder)/N2(g) Combustion Synthesis of Si3N4
Chapter G-3. SHS Production of Si3N4 Powders, Whiskers and Fibers
Chapter G-4. Si3N4 by Si/N2 Reactive Sputtering
Chapter G-5. Si3N4 via Si/N2 Reaction in Thermal Plasmas
Chapter G-6. Si3N4 Formation via Si(g)/N2, N, N-Plasma, N-Ion Reactions
Chapter G-7. Si3N4 Formation via Si+/(N-Plasma, N-Ion) Reactions
Chapter G-8. Mechano(-electro)chemical Nitridation of Si Powder
Part H. Si3N4 Formation by Reaction of Si with N-Compounds
Chapter H-1. Introduction to Si/N-Compound Reactions
Chapter H-2. Si3N4 Formation by Thermal Reactions of Si(s)/NH3(g)
Chapter H-3. Si3N4 via Stimulated Reactions of Si(s)/NH3(g)
Chapter H-4. Si3N4 Formation in other Si/NH3 Reaction Systems
Chapter H-5. Si(powder)/NH3(g) Powder Production in Thermal Plasmas
Chapter H-6. Si3N4 from Si(s) Plus N-N Bonded and other N-Compounds
Part Í. Si3N4 by Nitridation of Si-O Based Materials
Chapter Í-1. Si3N4 Formation via Sio(g,s)/(N2,NH3)/(H2,C,CH4)
Chapter Í-2. Si3N4 via C-Free Nitridation of SiOxHy, SiO2, Si2N2O
Chapter Í-3. SiO2/C/N2: Si3N4 by Carbothermal Nitridation of SiO2
Chapter Í-4. Si3N4 via other SiO2 Carbothermal Nitridation Systems
Chapter Í-5. SiO2 Carbothermal Nitridation Impurity/Additive Effects
Chapter Í-6. Si3N4 via Carbonitridation of Si-O Containing Materials
Part J. Si3N4 Formation Si-N Based Materials
Chapter J-1. Introduction to Si3N4 from Si-N Based Materials
Chapter J-2. Si3N4 Formation by Reactions of Si-N Materials
Chapter J-3. Si3N4 from Pyrolysis/Nitridation of Si-N-H Materials, General
Chapter J-4. Si3N4 Preparation by Pyrolysis of Si(NH)2
Chapter J-5. Si3N4 via Decomposition of Other Si-N-X Compounds
Part K. Comparative Overview and Summary of Si3N4 CVD
Chapter K-1. Chemical Vapor Deposition of Si3N4: Fundamentals
Chapter K-2. Methods for CVD of Si3N4 Thin Films
Part L. Si3N4 by CVD Nitridation of Si-H Compounds
Chapter L-1. Preamble: Si3N4 CVD from Silanes
Chapter L-2. Si3N4 Chemical Vapor Deposition from SiH4/N2
Chapter L-3. Si3N4 from SiH4/NH3 Thermal Reactions
Chapter L-4. Si3N4 Formation via Stimulated CVD from SiH4/NH3
Chapter L-5. SiH4/NH3(g) Formation of Si3N4 Powder
Chapter L-6. Si3N4 Formation from SiH4/N2H4(/NH3,N2,H2)
Chapter L-7. Si3N4 via Other SiHx CVD Nitridation Systems
Part M. Si3N4 by CVD Nitridation of Si Halides and Halosilanes
Chapter M-1. Preamble Re Si3N4 CVD from Si Halides and Halosilanes
Chapter M-2. Si3N4 via CVD Nitridation of Silicon Fluorides
Chapter M-3. Si3N4 Formation via SiCl4/(N2,NH3)(/H2,Ar,He) Reactions
Chapter M-4. Si3N4 from SiCl4/NH3 Reactions in Thermal Plasmas
Chapter M-5. Si3N4 Formation in Other SiClx Nitridation Systems
Chapter M-6. Si3N4 by Nitridation CVD from SiHCl3
Chapter M-7. Si3N4 Formation via SiH2Cl2 Nitridation
Chapter M-8. Si3N4 by CVD Nitridation of SiH3Cl, SiBr4, SiHBr3, SiI4
Part N. Si3N4 Formation in Si-C-N Systems
Chapter N-1. Si3N4 from Si-C-N-H(-Cl) CVD Reaction Systems
Chapter N-2. Si3N4 via Pyrolysis/Nitridation of SiC and Si-C-N Materials
Chapter N-3. Si3N4 from Pyrolysis/Nitridation of Organosilicon Polymers
Part O. Si3N4 Formation in Si-N-X Systems, X = B, P, S, Fe, Other
Chapter O-1. Si3N4 Formation in Si-N-(B, P, S) Systems
Chapter O-2. Si3N4In Situ Formation in Iron and Steel Alloys
Chapter O-3. Si3N4 Preparation by Reactions of Fe-Si Alloys and N2
Chapter O-4. Si3N4 Formation in Non-Fe Metal–Silicon–Nitrogen Systems
Index
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