2-vols. Set
Buch, Englisch, 1434 Seiten, Format (B × H): 170 mm x 240 mm, Gewicht: 2800 g
ISBN: 978-0-87849-357-9
Verlag: Trans Tech Publications
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Preface
Overview
Chapter 1: SiC Bulk Growth
1.1 Bulk Growth of 4H- and 6H-SiC
Growth of Crack-Free 100mm-Diameter 4H-SiC Crystals with Low Micropipe Densities
100 mm 4HN-SiC Wafers with Zero Micropipe Density
Investigations on Polytype Stability and Dislocation Formation in 4H-SiC Grown by PVT
Growth of 6H-SiC Single Crystals under Quasi-Equilibrium Conditions
Aluminum P-Type Doping of Bulk SiC Single Crystals by Tri-Methyl-Aluminum
Growth on Rhombohedral (01-1n) Plane: An Alternative for Preparation of High Quality Bulk SiC Crystals
Bulk SiC Crystal Growth at Constant Growth Rate Utilizing a New Design of Resistive Furnace
Application of 6H to 4H Polytype Conversion to Effective Reduction of Micropipes in 4H SiC Crystals
Status of Large Diameter SiC Single Crystals at II-VI
Occurrence of Polytype Transformation during Nitrogen Doping of SiC Bulk Wafer
The Observation and Explanation of Electricity Switch Phenomena in PVT Grown SiC Bulk
Simulation Study for HTCVD of SiC Using First-Principles Calculation and Thermo-Fluid Analysis
Computational Analysis of SiC HTCVD from Silicon Tetrachloride and Propane
1.2 Bulk Growth of 2H- and 3C-SiC
Growth of 2H-SiC Single Crystals in a C-Li-Si Ternary Melt System
Solution Growth of SiC Crystals in Si-Ti and Si-Ge-Ti Solvents
Stability Growth Condition for 3C-SiC Crystals by Solution Technique
Structural Characterization of CF-PVT Grown Bulk 3C-SiC
Comparative Study of Differently Grown 3C-SiC Single Crystals with Birefringence Microscopy
Chapter 2: SiC Epitaxial Growth
2.1 Milestones
SiC Epitaxial Growth on Multiple 100-mm Wafers and its Application to Power-Switching Devices
Silicon Carbide Growth:C/Si Ratio Evaluation and Modeling
Challenges for Improving the Crystal Quality of 3C-SiC Verified with MOSFET Performance
2.2 Homoepitaxial Growth
Advances in Multi- and Single-Wafer SiC Epitaxy for the Production and Development of Power Diodes
Extremely Uniform, High Quality SiC Epitaxy on 100-mm Substrates
High Quality Epitaxial Growth on 4° Off-Axis 4H SiC with Addition of HCl
Homoepitaxial Growth of 4H-SiC on On-Axis Si-Face Substrates Using Chloride-Based CVD
Development of a High Rate 4H-SiC Epitaxial Growth Technique Achieving Large-Area Uniformity
Very High Growth Rate of 4H-SiC Using MTS as Chloride-Based Precursor
Development of a Practical High-Rate CVD System
SiC-4H Epitaxial Layer Growth by Trichlorosilane (TCS) as Silicon Precursor at Very High Growth Rate
Thin SiC-4H Epitaxial Layer Growth by Trichlorosilane (TCS) as Silicon Precursor with Very Abrupt Junctions
Multi-Level Simulation Study of Crystal Growth and Defect Formation Processes in SiC
Theoretical Monte Carlo Study of the Formation and Evolution of Defects in the Homoepitaxial Growth of SiC
Investigation of Triangular Defects in 4H-SiC 4° Off Cut (0001) Si Face Epilayers Grown by CVD
Influence of Substrate Preparation and Epitaxial Growth Parameters on the Dislocation Densities in 4H-SiC Epitaxial Layers
In Situ Boron and Aluminum Doping and Their Memory Effects in 4H-SiC Homoepitaxial Layers Grown by Hot-Wall LPCVD
Homoepitaxial Growth of 4H-SiC by Hot-Wall CVD Using BTMSM
Effect of Substrates Thermal Etching on CVD Growth of Epitaxial Silicon Carbide Layers
Nitrogen Doping in Low-Temperature Halo-Carbon Homoepitaxial Growth of SiC
Local-Loading Effect in Low-Temperature Selective Epitaxial Growth of 4H-SiC by Halo-Carbon Method
Micropipe Dissociation through Thick n+ Buffer Layer Growth
Growth Mechanism and 2D Aluminum Dopant Distribution of Embedded Trench 4H-SiC Region
In Situ Nitrogen and Aluminum Doping in Migration Enhanced Embedded Epitaxial Growth of 4H-SiC
Solution Growth of Off-Axis 4H-SiC for Power Device Application
Epitaxial TaC Films for the Selective Area Growth of SiC
2.3 Heteropolytypic and Heteroepitaxial Growth
Solution Growth of 3C-SiC on 6H-SiC Using Si Solvent under N2-He Atmosphere
Solution Growth of 3C-SiC Single Crystals by Cold Crucible Technique
Growth Mechanism of 3C-SiC Heteroepitaxial Layers on a-SiC by VLS
Growth Kinetics of 3C-SiC on a-SiC by VLS
3C-SiC Islands Formation on 6H-SiC(0001) Substrate from a Liquid Phase
Strain in 3C–SiC Heteroepitaxial Layers Grown on (100) and (111) Oriented Silicon Substrates
Growth of 3C-SiC on Si: Influence of Process Pressure
Void Formation in Differently Oriented Si in the Early Stage of SiC Growth
3C-SiC on Si Substrates Using Pendeo-Epitaxial Growth
Influence of Growth Parameters on the Residual Strain in 3C-SiC Epitaxial Layers on (001) Silicon
Island Formation of SiC Film on Striated Si(001) Substrates
Structural and Morphological Characterization of 3C-SiC Films Grown on (111), (211) and (100) Silicon Substrates
Heteroepitaxial Growth of 3C-SiC on Si (111) at Low Substrate Temperature by Plasma Assisted CVD
Buckling Stabilization and Stress Reduction in SiC on Si by i-FLASiC Processing
3C-SiC Heteroepitaxy on (100), (111) and (110) Si Using Trichlorosilane (TCS) as the Silicon Precursor.
Hetero-Epitaxial Growth of 3C-SiC with Smooth Surface on Si(001) Using Acetylene Gas
Heteroepitaxial Growth of 3C-SiC on Si (111) Substrate Using AlN as a Buffer Layer
Characteristics of Polycrystalline 3C-SiC Thin Films Grown on AlN Buffer Layer by CVD
Chapter 3: Physical Properties and Characterization of SiC
3.1 Milestones
Aspects of Dislocation Behavior in SiC
Investigation of Defect Formation in 4H-SiC(0001) and (000-1) Epitaxy
Temperature Dependence of Shockley Stacking Fault Expansion and Contraction in 4H-SiC p-i-n Diodes
EPR Identification of Defects and Impurities in SiC: To be Decisive
Defects Identified in SiC and Their Implications
Atomic and Electronic Structure of the (2×1) and c(2×2) 4H-SiC(1-102) Surfaces
3.2 Extended Defects
Sense Determination of c-Axis Screw Dislocations in 4H-SiC
Studies of the Distribution of Elementary Threading Screw Dislocations in 4H Silicon Carbide Wafer
High-Resolution Topography Analysis on Threading Edge Dislocations in 4H-SiC Epilayers
Observation of Misfit Dislocations Introduced by Epi-Layer Growth on 4H-SiC
Dislocation Contrast of 4H-SiC in X-Ray Topography under Weak-Beam Condition
Evolution of Basal Plane Dislocations during 4H-SiC Epitaxial Growth
Contrast of Basal Plane and Threading Edge Dislocations in 4H-SiC by X-Ray Topography in Grazing Incidence Geometry
Slip of Basal Plane Dislocations in 4H-SiC Epitaxy
Pair-Generation of the Basal-Plane-Dislocation during Crystal Growth of SiC
Characterization of Dislocations and Micropipes in 4H n+ SiC Substrates
Raman Scattering Study of Stress Distribution around Dislocation in SiC
Stacking Fault Formation in Highly Nitrogen-Doped 4H-SiC Substrates with Different Surface Preparation Conditions
Differences in Emission Spectra of Dislocations in 4H-SiC Epitaxial Layers
Expansion of Stacking Faults in 4H-SiC Epitaxial Layer under Laser Light Excitation during Room Temperature Photoluminescence Mapping
Expansion of Stacking Faults by Electron-Beam Irradiation in 4H-SiC Diode Structure
Synchrotron X-Ray Topographic Studies of Recombination Activated Shockley Partial Dislocations in 4H-Silicon Carbide Epitaxial Layers
X-Ray Rocking Curve Characterization of SiC Substrates
TEM Observation of the Polytype Transformation of Bulk SiC Ingot
Structural Analysis of Off-Axis SiC Planes for the Growth of SiC and AlGaN Films
Delineation of Defects Reducing Schottky Barrier Heights on 4H-SiC by the Electrochemical Deposition
Investigation of Pits Formed at Oxidation on 4H-SiC
3.3 Point Defects
Intrinsic Defects in HPSI 6H-SiC: an EPR Study
Defect Level of the Carbon Vacancy-Carbon Antisite Pair Center in SI 4H SiC
Behavior of Native Defects in Semi-Insulating 4H-SiC after High Temperature Anneals and Different Cool-Down Rates
Characterization of Traps in Semi-Insulating 4H-SiC by Discharge Current Transient Spectroscopy
The Electronic Structure of the UD-4 Defect in 4H, 6H and 15R SiC
Deep Levels Responsible for Semi-Insulating Behavior in Vanadium-Doped 4H-SiC Substrates
Contact-Less Electrical Defect Characterization of Semi-Insulating 6H-SiC Bulk Material
Photo-EPR Study of Vacancy-Type Defects in Irradiated n-Type 4H-SiC
New Type of Defects Explored by Theory: Silicon Interstitial Clusters in SiC
Effect of the Schottky Barrier Height on the Detection of Midgap Levels in 4H-SiC by Deep Level Transient Spectroscopy
Search for Hydrogen Related Defects in p-Type 6H and 4H-SiC
Carrier Removal in Electron Irradiated 4H and 6H SiC
Evolution of D1-Defect Center in 4H-SiC during High Temperature Annealing
The Formation and Annealing of Carbon Interstitial-Related Complexes in Electron-, Proton- and Helium Irradiated 4H SiC
Identification of Neutral Carbon Vacancy-Carbon Anti-Site Complex by Low Temperature Photoluminescence Spectroscopy
3.4 Impurities
Ionization Energies of Phosphorus Donors in 6H-SiC
Wave-Function Symmetry and the Properties of Shallow P Donors in 4H SiC
Infrared PL Signatures of n-Type Bulk SiC Substrates with Nitrogen Impurity Concentration between 1016 and 1017 cm-3
A Comparison of Transient Boron Diffusion in Silicon, Silicon Carbide and Diamond
Diffusion and Electroluminescence Studies of Low Temperature Diffusion of Boron in 3C-SiC
Titanium Related Luminescence in SiC
Raman Investigation of the Effect of Metal Impurities at Gettering Sites on Phonon and Electron Related Properties of 4H-SiC n-n+ Junctions
3.5 Surface
Nitrogen Passivation of (0001) 4H-SiC Dangling Bonds
Origin of Giant Step Bunching on 4H-SiC (0001) Surfaces
3.6 Fundamental Properties
Enhanced Annealing of the Main Lifetime Limiting Defect in Thick 4H-SiC Layers
Impact of 4H-SiC Substrate Defectivity on Epilayer Injected Carrier Lifetimes
Generation and Recombination Carrier Lifetimes in 4H SiC Epitaxial Wafers
Variations in the Measured Carrier Lifetimes of n- 4H-SiC Epilayers
Investigation of the Internal Carrier Distribution in 4H-SiC Pin-Diodes by Laser Absorption Experiments
Computational Evaluation of Electrical Conductivity on SiC and the Influence of Crystal Defects
Characterization of Electrical Properties in SiC Crystals by Raman Scattering Spectroscopy
Raman Characteristics of Poly 3C-SiC Thin Films Deposited on AlN Buffer Layer
Characterization of Electronic Properties of Different SiC Polytypes by All-Optical Means
The Specific Features of High-Field Transport in SiC Polytypes
Thermal Expansion Coefficients of 6H Silicon Carbide
Studies of Thermal Anisotropy in 4H-, 6H-SiC Bulk Single Crystal Wafers by Photopyroelectric (PPE) Method
Improvement of the Thermal Conductivity in 4H-SiC Epitaxial Layer by Introducing Gettering Sites
Optical Study of Ge Incorporation in Cubic SiC Layers Grown by VLS
SiC Polytype Stability Influenced by Ge Impurities
Space Charge Waves in 6H-SiC and 4H-SiC
Galvanomagnetic Properties of 3C-SiC/6H-SiC Heterostructures
3.7 Wafer Mapping and Characterization Techniques
Rapid Characterization of SiC Crystals by Full-Wafer Photoluminescence Imaging under Below-Gap Excitation
Mapping of Defects in Large-Area Silicon Carbide Wafers via Photoluminescence and its Correlation with Synchrotron White Beam X-Ray Topography
Imaging and Metrology of Silicon Carbide Wafers by Laser-Based Optical Surface Inspection System
Contactless Topographic Analysis of Locally Inhomogeneous Resistivity in SiC and Cd(Zn)Te
Chapter 4: SiC Nanostructures and Graphene
Evolution and Structure of Graphene Layers on SiC(0001)
Graphene Layers on Silicon Carbide Studied by Raman Spectroscopy
Dots Formation by CVD in the SiC-Si Hetero-System
Electronic Band Structure of Cubic Silicon Carbide Nanowires
Theoretical Comparison of 3C-SiC and Si Nanowire FETs in Ballistic Regime
Chapter 5: Processing of SiC
5.1 Milestones
Crystalline Recovery after Activation Annealing of Al Implanted 4H-SiC
Dynamical Simulation of SiO2/4H-SiC Interface on C-Face Oxidation Process: From First Principles
Influence of the Oxidation Temperature and Atmosphere on the Reliability of Thick Gate Oxides on the 4H-SiC C(000-1) Face
5.2 Implantation and Doping
Annealing Temperature Dependence of the Electrically Active Profiles and Surface Roughness in Multiple Al Implanted 4H-SiC
Dual-Pearson Approach to Model Ion-Implanted Al Concentration Profiles for High-Precision Design of High-Voltage 4H-SiC Power Devices
Detection and Characterization of Defects Induced by Ion Implantation/Annealing Process in SiC
Depth Profiling of Al Ion-Implantation Damage in SiC Crystals by Cathodoluminescence Spectroscopy
Compensation Effects in 7 MeV C Irradiated n-Doped 4H-SiC
Structure and Lattice Location of Ge Implanted 4H-SiC
Laser Doping of Chromium and Selenium in p-Type 4H-SiC
5.3 Contacts and Etching
Phase Formation and Growth Kinetics of an Interface Layer in Ni/SiC
Backside Nickel Based Ohmic Contacts to n-Type Silicon Carbide
Comparison of Electrical Properties of Ohmic Contact Realized on p-Type 4H-SiC
Electrical Characteristics of Ti/4H-SiC Slicidation Schottky Barrier Diode
Investigation of Subcontact Layers in SiC after Diffusion Welding
Isotropic Etching of SiC
4H Silicon Carbide Etching Using Chlorine Trifluoride Gas
Anisotropic Etching of SiC in the Mixed Gas of Chlorine and Oxygen
5.4 Oxides and Other Dielectrics
Model Calculation of SiC Oxidation Rates in the Thin Oxide Regime
Oxygen-Partial-Pressure Dependence of SiC Oxidation Rate Studied by In Situ Spectroscopic Ellipsometry
TEM Observation of SiO2/4H-SiC Hetero Interface
Influence of Metallization Annealing on Channel Mobility in 4H-SiC MOSFET on Carbon Face
Enhanced Channel Mobility in 4H-SiC MISFETs by Utilizing Deposited SiN/SiO2 Stack Gate Structures
Anomalously High Channel Mobility in SiC-MOSFETs with Al2O3/SiOx/SiC Gate Structure
Scattering Mechanisms in Silicon Carbide MOSFETs with Gate Oxides Fabricated Using Sodium Enhanced Oxidation Technique
High Channel Mobility of MOSFET Fabricated on 4H-SiC (11-20) Face Using Wet Annealing
High Channel Mobility of 4H-SiC MOSFET Fabricated on Macro-Stepped Surface
Improvement of Electron Channel Mobility in 4H SiC MOSFET by Using Nitrogen Implantation
Reduction of Interface Traps and Enhancement of Channel Mobility in n-Channel 6H-SiC MOSFETs by Irradiation with Gamma-Rays
Effects of Fabrication Process on the Electrical Characteristics of n-Channel MOSFETs Irradiated with Gamma-Rays
4H-SiC p-Channel MOSFETs with Epi-Channel Structure
Atomistic Scale Modeling of Factors Affecting the Channel Mobility in 4H-SiC MOSFETs
Electrically Detected Magnetic Resonance Studies of Processing Variations in 4H SiC Based MOSFETs
The Inefficiency of H2-Passivation as a Criterion for the Origin of SiC/SiO2 Deep Interface States - a Theoretical Study
Two Different Species of Traps Monitored at N-Implanted 3C-SiC MOS Capacitors by Conductance Spectroscopy
Effect of Post-Oxidation Annealing on High-Temperature Grown SiO2/4H-SiC Interface
Influence of Ambient, Gate Metal and Oxide Thickness on Interface State Density and Time Constant in MOSiC Capacitor
High Frequency Inversion Capacitance Measurements for 6H-SiC n-MOS Capacitors from 450 to 600 °C
The Effect of Nitridation on SiC MOS Oxides as Evaluated by Charge Pumping
Criteria for Accurate Measurement of Charge-Pumping Current in 4H-SiC MOSFETs
Optimization of 4H-SiC MOS Properties with Cesium Implantation
A Study of Deep Energy-Level Traps at the 4H-SiC/SiO2 Interface and Their Passivation by Hydrogen
Interface and Carrier Transport Behaviour in Al/HfO2/SiO2/SiC Structure
Improved Properties of AlON/4H SiC Interface for Passivation Studies
Influence of Annealing on the Al2O3/4H-SiC Interface
Post Metallization Annealing Characterization of Interface Properties of High- Dielectrics Stack on Silicon Carbide
Correlation between Thermal Oxide Breakdown and Defects in n-Type 4H-SiC Epitaxial Wafers
Reliability of Thermal Oxides Grown on n-Type 4H-SiC Implanted with Low Nitrogen Concentration
Impact of the Wafer Quality on the Reliability of MOS Structure on the C-Face of 4H-SiC
Gate-Area Dependence of SiC Thermal Oxides Reliability
Effect of Gate Wet Reoxidation on Reliability and Channel Mobility of Metal-Oxide-Semiconductor Field-Effect Transistors Fabricated on 4H-SiC(000-1)
Negative Field Reliability of ONO Gate Dielectric on 4H-SiC
TDDB Measurement of Gate SiO2 on 4H-SiC Formed by Chemical Vapor Deposition
Impact of Nitridation on Negative and Positive Charge Buildup in SiC Gate Oxides
Temperature-Dependence of SiC MOSFET Threshold-Voltage Instability
Characteristics of Sol-Gel Derived SiO2 Thick Film on 4H-SiC
5.5 Polishing and Related Processes
New Chemical Planarization of SiC and GaN Using an Fe Plate in H2O2 Solution
Development of Lapping and Polishing Technologies of 4H-SiC Wafers for Power Device Applications
Improvements in Electrical Properties of SiC Surface Using Mechano-Chemical Polishing
The Impact of Chemical-Mechanical Polishing on Defective 4H-SiC Schottky Barrier Diodes
Effect of Process Parameters on Material Removal Rate in Chemical Mechanical Polishing of 6H-SiC(0001)
Damage-Free Planarization of 2-Inch 4H-SiC Wafer Using Pt Catalyst Plate and HF Solution
The Preparation of World-Class Single Crystal Silicon Carbide Wafers Using High Rate Chemical Mechanical Planarization Slurries
Beveling of Silicon Carbide Wafer by Plasma Chemical Vaporization Machining
Temperature Dependence of Plasma Chemical Vaporization Machining of Silicon and Silicon Carbide
Electric Discharge Machining for Silicon Carbide and Related Materials
Characterization of Electric Discharge Machining for Silicon Carbide Single Crystal
5.6 Micromachining and MEMS
A Silicon Carbide Accelerometer for Extreme Environment Applications
An Examination of Material-Related Performance in SiC Heated Elements for IR Emitter and Sensor Applications
Mechanical Properties of Poly 3C-SiC Thin Films According to Carrier Gas (H2) Concentration
Novel Use of Columnar Porous Silicon Carbide Structures as Nanoimprint Lithography Stamps
Etching Characteristics of Polycrystalline 3C-SiC Films Using Enhanced RIE
Femtosecond Laser-Induced Surface Patterning on 4H-SiC
Cross-Sectional TEM Analysis of Structural Change in 4H-SiC Single Crystal Irradiated by Femtosecond Laser Pulses
Chapter 6: SiC Devices
6.1 Milestones
Present Status and Future Prospects for Electronics in EVs/HEVs and Expectations for Wide Bandgap Semiconductor Devices
Critical Technical Issues in High Voltage SiC Power Devices
SiC JFET: Currently the Best Solution for an Unipolar SiC High Power Switch
Challenges of 4H-SiC MOSFETs on the C(000-1) Face toward the Achievement of Ultra Low On-Resistance
Normally-Off 1400V/30A 4H-SiC DACFET and its Application to DC-DC Converter
Applications-Based Design of SiC Technology
New Applications in Power Electronics Based on SiC Power Devices
6.2 Schottky Barrier Diodes
Development of Large Area (up to 1.5 cm2) 4H-SiC 10 kV Junction Barrier Schottky Rectifiers
Reliability Aspects of High Voltage 4H-SiC JBS Diodes
1200-V JBS Diodes with Low Threshold Voltage and Low Leakage Current
High-Current 10 kV SiC JBS Rectifier Performance
5 kV, 9.5 A SiC JBS Diodes with Non-Uniform Guard Ring Edge Termination for High Power Switching Application
10 kV Silicon Carbide Junction Barrier Schottky Rectifier
Breakdown Behavior of 900-V 4H-SiC Schottky Barrier Diodes Terminated with Boron-Implanted pn-Junction
Effect of the Doping Concentration and Space of Both p-Grid and Field Limiting Ring on 4H-SiC Junction Barrier Schottky Diode with Single Ion Implantation Process
Structure Analysis of In-Grown Stacking Faults and Investigation of the Cause for High Reverse Current of 4H-SiC Schottky Barrier Diode
Characterization of Schottky Diodes on 4H-SiC with Various Off-Axis Angles Grown by Sublimation Epitaxy
Schottky Barrier Diode Fabricated by MOCVD-Grown Epilayer Using Bis-Trimethylsilylmethane Precursor
Device Simulation Model for Transient Analysis of SiC-SBD
Distribution of Forward Voltage of SiC Schottky Barrier Diode Using Ti Sintering Process
Impact of High-k Dielectrics on Breakdown Performances of SiC and Diamond Schottky Diodes
Field-Plate Terminated Pt/n- 4H-SiC SBD Using Thermal SiO2 and Sputter Deposited AlN Dielectric Stack
6.3 PiN Diodes
3.3 kV-10A 4H-SiC PiN Diodes
Bevel Mesa Combined with Implanted Junction Termination Structure for 10 kV SiC PiN Diodes
Observation of Crystalline Defects Causing pn Junction Reverse Leakage Current
Comparative Evaluation of Anode Layers on the Electrical Characteristics of High Voltage 4H-SiC PiN Diodes
Self-Heating of 4H-SiC PiN Diodes at High Current Densities
Impact of RIE Etching on the Breakdown Voltage of 4H-SiC Mesa Diodes
Novel SiC Zener Diodes with High Operating Temperature of 300°C and High Power Density of 40 kW/cm2
Microwave Switches and Modulators Based on 4H-SiC p-i-n Diodes
Annealing Effect on Characteristics of p+n 4H-SiC Diode Formed by Al Ion Implantation
Room Temperature Annealing Effects on Leakage Current of Ion Implanted p+n 4H-SiC Diodes
Determination of Ambipolar Lifetime and Epilayer Thickness of 5kV SiC Bipolar Devices by Transient Switching Studies
Numerical Evaluation of Forward Voltage in SiC Pin Diode with Non-Ohmic Current
