Buch, Englisch, Band 336, 613 Seiten, Paperback, Format (B × H): 160 mm x 240 mm, Gewicht: 988 g
Reihe: NATO Science Series E:
Buch, Englisch, Band 336, 613 Seiten, Paperback, Format (B × H): 160 mm x 240 mm, Gewicht: 988 g
Reihe: NATO Science Series E:
ISBN: 978-94-010-6486-6
Verlag: Springer Netherlands
Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications.
Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
Zielgruppe
Research
Autoren/Hrsg.
Fachgebiete
- Technische Wissenschaften Maschinenbau | Werkstoffkunde Produktionstechnik Fertigungstechnik
- Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Materialwissenschaft: Elektronik, Optik
- Technische Wissenschaften Energietechnik | Elektrotechnik Elektrotechnik
- Technische Wissenschaften Elektronik | Nachrichtentechnik Elektronik
- Naturwissenschaften Physik Quantenphysik Atom- und Molekülphysik
Weitere Infos & Material
Plasma Etching.- to Plasma Etching.- Plasma Chemistry, Basic Processes and PECVD.- The Role of Ions in Reactive Ion Etching with Low Density Plasmas.- SiO2 Etching in High-Density Plasmas: Differences with Low-Density Plasmas.- Plasma Deposition.- to Plasma Enhanced Chemical Vapor Deposition.- Topography Evolution During Semiconductor Processing.- Deposition of Amorphous Silicon.- Plasma Sources.- High Density Sources for Plasma Etching.- Resonant Plasma Excitation by Electron Cyclotron Waves—Fundamentals and Applications.- The Transition from Capacitive to Inductive to Wave Sustained Discharges.- Physics of Surface-Wave Discharges.- Plasma-Surface Interactions.- Surface Science Aspects of Etching and Wall Reactions in High Density Plasmas.- Plasma-Surface Interactions.- Cl2 Plasma-Si Surface Interactions in Plasma Etching.- Numerical Modeling.- Particle in Cell Monte Carlo Collision Codes (PIC-MCC); Methods and Applications to Plasma Processing.- Fluid and Hybrid Models of Non Equilibrium Discharges.- Plasma Diagnostics.- Optical Diagnostics of Processing Plasmas.- Optical Diagnostics of Plasmas: A Tool for Process Control.- Infrared Absorption Spectroscopy as a Diagnostic for Processing Plasmas.- Ellipsometric Analysis of Plasma Deposited and Plasma Etched Materials.- Mass Spectrometry of Reactive Plasmas.- Less Conventional Processing Applications of Plasmas.- Deposition of Silicon Dioxide Films using the Helicon Diffusion Reactor for Integrated Optics Applications.- Remote Plasma Processing.- Magnetized Surface-Wave Discharges for Submicrometer Pattern Transfer.- Dusty Plasmas: Fundamental Aspects and Industrial Applications.- Industrial Application of Plasmas for Processing.- Low Energy Plasma Beams for Semiconductor Technology.- Process Control Concepts.- Issuesand Solutions for Applying Process Control to Semiconductor Manufacturing.
