Sonstiges, Englisch, 200 Seiten, Format (B × H): 125 mm x 142 mm, Gewicht: 200 g
Sonstiges, Englisch, 200 Seiten, Format (B × H): 125 mm x 142 mm, Gewicht: 200 g
ISBN: 978-3-03795-003-6
Verlag: Trans Tech Publications
Volume is indexed by Thomson Reuters CPCI-S (WoS).
Autoren/Hrsg.
Fachgebiete
Weitere Infos & Material
ZnO Films and Crystals on Bulk Silicon and SOI Wafers: Formation, Properties and ApplicationsInfluence of Hydrogen Plasma Treatment on a-SiC Resistivity of the SiC/SiO2/Si StructuresDiamond ? Graphite Heterostructures Formed by Nitrogen and Hydrogen Implantation and AnnealingHydrogen Gettering within Processed Oxygen-Implanted SiliconGate Control of Junction Impact Ionization Avalanche in SOI MISFETs: Theoretical ModelSemi-Analytical Models of Field-Effect Transistors with Low-Dimensional ChannelsModel of Nonuniform Channel for the Charge Carrier Transport in Nanoscale FETsHigh Temperature Effects on Harmonic Distortion in Submicron SOI Graded-Channel MOSFETsSome Issues of Modeling the Double Barrier Metal-Oxide-Semiconductor Tunnel StructuresElectrical Properties of High-K LaLuO3 Gate Oxide for SOI MOSFETsEffects of High?Energy Neutrons on Advanced SOI MOSFETsPolysilicon on Insulator Structures for Sensor Application at Electron Irradiation & Magnetic FieldsOn-Chip Tensile Testing of the Mechanical and Electro-Mechanical Properties of Nano-Scale Silicon Free-Standing BeamsNon-Standard FinFET Devices for Small Volume Sample Sensors3D SOI Elements for System-on-Chip ApplicationsRoutes towards Novel Active Pressure Sensors in SOI TechnologyPhotovoltage Performance of Ge/Si Nanostructures Grown on Intermediate Ultrathin SiOX LayersInterface and Bulk Properties of High-K Gadolinium and Neodymium Oxides on SiliconEffect of Ge Nanoislands on Lateral Photoconductivity of Ge-SiOX-Si StructuresA Model of the Evolution of the Au/Si Droplet Ensembles during Rapid Thermal Annealing at High TemperaturesThe Nanometer Scaled Defects Induces with the Dislocation Motion in II-VI Insulated Semiconductors